Simulasi 1D Pengaruh Tekanan Terhadap Densitas Elektron pada Plasma Argon DC Bias Discharge

Muhammad Ghufron, E. E Yunata, T. Aizawa

Abstract

Abstract—Telah dilakukan simulasi 1D plasma Argon dengan mengggunakan pembangkit DC Bias. Simulasi dilakukan menggunakan software Comsol Multiphysics dimana pada simulasi asumsi suhu dijaga konstan 400K dan tekanan rendah dibawah 80 Pa. Simulasi dilakukan untuk mengetahui distribusi plasma Argon di dalam chamber ketika generator DC Bias diaplikasikan pada gas netral Argon di dalam chamber. Hasil simulasi menunjukkan bahwa distribusi densitas plasma (ne, ni) tertinggi diketahui terletak sangat dekat dengan elektroda negatif dan semakin mengecil secara eksponensial menuju ground. Hal ini di dukung juga dari distribusi temperatur elektron (Te) yang memiliki tren yang sama. Pada variasi tekanan diketahui bahwa dengan menaikkan tekanan gas di dalam chamber mampu menaikkan densitas plasma secara linear.

 

Kata Kunci— Comsol Multiphysics, Plasma, Plasma Argon dan DC Bias Discharge. 

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Authors

Muhammad Ghufron
mghufron@ub.ac.id (Primary Contact)
E. E Yunata
T. Aizawa
Author Biographies

Muhammad Ghufron, FMIPA Universitas Brawijaya

Dosen jurusan Fisika

E. E Yunata, Shibaura Institute of Technology, Tokyo, Jepang

mahasiswa doctoral di Jurusan Fisika

T. Aizawa, Shibaura Institute of Technology, Tokyo, Jepang

Profesor di Jurusan Fisika
[1]
M. Ghufron, E. E. Yunata, and T. Aizawa, “Simulasi 1D Pengaruh Tekanan Terhadap Densitas Elektron pada Plasma Argon DC Bias Discharge”, SMARTICS, vol. 2, no. 1, pp. 30–33, Apr. 2016.

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