Simulasi 1D Pengaruh Tekanan Terhadap Densitas Elektron pada Plasma Argon DC Bias Discharge

Authors

  • Muhammad Ghufron FMIPA Universitas Brawijaya
  • E. E Yunata Shibaura Institute of Technology, Tokyo, Jepang
  • T. Aizawa Shibaura Institute of Technology, Tokyo, Jepang

Abstract

Abstractâ€â€Telah dilakukan simulasi 1D plasma Argon dengan mengggunakan pembangkit DC Bias. Simulasi dilakukan menggunakan software Comsol Multiphysics dimana pada simulasi asumsi suhu dijaga konstan 400K dan tekanan rendah dibawah 80 Pa. Simulasi dilakukan untuk mengetahui distribusi plasma Argon di dalam chamber ketika generator DC Bias diaplikasikan pada gas netral Argon di dalam chamber. Hasil simulasi menunjukkan bahwa distribusi densitas plasma (ne, ni) tertinggi diketahui terletak sangat dekat dengan elektroda negatif dan semakin mengecil secara eksponensial menuju ground. Hal ini di dukung juga dari distribusi temperatur elektron (Te) yang memiliki tren yang sama. Pada variasi tekanan diketahui bahwa dengan menaikkan tekanan gas di dalam chamber mampu menaikkan densitas plasma secara linear.

 

Kata Kunci Comsol Multiphysics, Plasma, Plasma Argon dan DC Bias Discharge. 

Author Biographies

Muhammad Ghufron, FMIPA Universitas Brawijaya

Dosen jurusan Fisika

E. E Yunata, Shibaura Institute of Technology, Tokyo, Jepang

mahasiswa doctoral di Jurusan Fisika

T. Aizawa, Shibaura Institute of Technology, Tokyo, Jepang

Profesor di Jurusan Fisika

References

[1] Goebel, D. M and Ira Katz, Fundamental of Electric Propulsion : Ion and Hall Truster. JPL Space Science and Technology Series : NASA. March. 2008. pp. 37-304
[2] Langmuir, I. Oscillations in ionized gases. Proc. Nat. Acad. Sci. U.S., vol. 14, p. 628. 1928.
[3] Scholtz, N., Jarmila P., Hana S., Josef K., A tool for decontamination and disinfection. Biotechnology Advances. Vol 33, pp. 1108-1119. 2014.
[4] Kapczinski, M.P., Carlos Gil., Eder J.K., Carlos A.S., Surface Modification of Titanium by Plasma Nitriding. Material Research. Vol. 6 pp. 265-271. 2003.
[5] Yi, Heon Chen., Tae Whan Kim., Keun-Ho Kim., Woo Seung Kang., Ji Hyun Kim., Soon Kook Hong. Atmospheric Pressure Plasma Ashing for Display Manufacturing. Japanese Journal of Applied Physics. Vol. 47 No. 8S2. 2008
[6] E.E. Yunata and T. Aizawa., Micro-texturing into DLC/diamond coated molds and dies via high density oxygen plasma etching. Manufacturing Review. Pp. 1-7. 2015.
[7] Sohbatzadeh, Farshad., et al., Characterization of diamond-like carbon thin film synthesized by RF atmospheric pressure plasma Ar/CH4 jet. Superlattices and Microstructures. Vol. 89 pp. 231-241.
[8] Bolshakov, et al., High-rate growth of single crystal diamond in microwave plasma in CH4/H2 and CH4/H2/Ar gas mixtures in presence of intensive soot formation. Diamond and Related Materials. Vol. 62. Pp. 49-57
[9] Yan, Xiao.et. Al., Removal of p-chlorophenol in mist by DC corona discharge plasma. Chemical Engineering Journal. Vol. 245. pp. 41-46. 2014.
[10] G.J.M. Hagelaar and L.C. Pitchford, “Solving the Boltzmann Equation to Obtain Elektron Transport Coefficients and Rate Coefficients for Fluid Models,” Plasma Sources Science and Technology, vol. 14, pp. 722–733, 2005

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Published

2016-04-19

How to Cite

[1]
M. Ghufron, E. E. Yunata, and T. Aizawa, “Simulasi 1D Pengaruh Tekanan Terhadap Densitas Elektron pada Plasma Argon DC Bias Discharge”, SMARTICS, vol. 2, no. 1, pp. 30–33, Apr. 2016.

Issue

Vol. 2 No. 1: SMARTICS Journal (April 2016)

Section

Article

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